AMAT Applied Materials 0190-48491適配器 PDF資料
1.產(chǎn) 品 資 料 介 紹：
AMAT Applied Materials 0190-48491 適配器（離子計(jì)組件）產(chǎn)品應(yīng)用領(lǐng)域
一、產(chǎn)品概述
AMAT Applied Materials 0190-48491 是一款 雙燈絲熱離子計(jì)（Dual Filament Hot Ion Gauge）組件，常被用于真空系統(tǒng)中作為壓力檢測傳感器。
該組件能夠測量從高真空到超高真空范圍內(nèi)的壓力，常用于半導(dǎo)體工藝設(shè)備的真空監(jiān)控與反饋控制系統(tǒng)。
它屬于 AMAT（應(yīng)用材料公司）設(shè)備中的核心真空測控元件，尤其用于高密度等離子體（HDP）CVD 及 PVD 工藝平臺，如 AMAT HDP100、Endura、Centura 等系列。
二、技術(shù)特性
類型：雙燈絲熱離子真空計(jì)（Dual Filament Hot Cathode Ion Gauge）
測量范圍：約 10?? ～ 10?? Torr
輸出信號：0.8～10 V 模擬電壓信號
安裝方式：標(biāo)準(zhǔn)真空法蘭接口（配合真空系統(tǒng)腔體安裝）
應(yīng)用特征：高靈敏度、響應(yīng)速度快、可在惡劣真空工況下長期穩(wěn)定工作
常與：真空控制器、電源模塊、真空泵系統(tǒng)共同構(gòu)成閉環(huán)壓力控制系統(tǒng)
三、產(chǎn)品應(yīng)用領(lǐng)域
| 應(yīng)用領(lǐng)域 | 具體作用 |
|---|---|
| 半導(dǎo)體制造設(shè)備 | 用于監(jiān)測 CVD（化學(xué)氣相沉積）、PVD（物理氣相沉積）、ALD（原子層沉積）、刻蝕等腔體中的真空壓力。通過離子化原理實(shí)現(xiàn)實(shí)時(shí)壓力檢測，確保工藝在設(shè)定真空條件下穩(wěn)定進(jìn)行。 |
| 等離子體反應(yīng)設(shè)備 | 在等離子體處理過程中，控制真空度是維持離子能量和密度的關(guān)鍵參數(shù)，該離子計(jì)可實(shí)時(shí)反饋腔體真空狀態(tài)。 |
| 離子注入設(shè)備 | 在注入腔內(nèi)維持穩(wěn)定高真空，防止離子束散射，提高注入精度。 |
| 真空泵及系統(tǒng)監(jiān)控 | 作為真空監(jiān)控傳感器，與機(jī)械泵、分子泵、渦輪泵等配合，用于反饋真空系統(tǒng)壓力，保證泵浦性能穩(wěn)定。 |
| 設(shè)備維護(hù)與校準(zhǔn) | 用于系統(tǒng)真空度驗(yàn)證、密封檢測、泄漏診斷及設(shè)備狀態(tài)評估。 |
AMAT Applied Materials 0190-48491適配器 英文介紹
AMAT Applied Materials 0190-48491 Adapter (Ion Meter Component) Product Application Fields
1、 Product Overview
AMAT Applied Materials 0190-48491 is a Dual Filament Hot Ion Gauge component commonly used as a pressure sensing sensor in vacuum systems.
This component is capable of measuring pressure ranging from high vacuum to ultra-high vacuum, and is commonly used in vacuum monitoring and feedback control systems for semiconductor process equipment.
It belongs to the core vacuum measurement and control component in AMAT (Applied Materials Company) equipment, especially used for high-density plasma (HDP) CVD and PVD process platforms, such as AMAT HDP100, Endura, Centura and other series.
2、 Technical characteristics
Type: Dual Filament Hot Cathode Ion Gauge
Measurement range: approximately 10 ?? to 10 ?? Torr
Output signal: 0.8-10 V analog voltage signal
Installation method: Standard vacuum flange interface (installed in conjunction with the vacuum system chamber)
Application features: high sensitivity, fast response speed, and long-term stable operation under harsh vacuum conditions
Often used in conjunction with vacuum controllers, power modules, and vacuum pump systems to form a closed-loop pressure control system
3、 Product application areas
Specific role of application field
Semiconductor manufacturing equipment is used to monitor the vacuum pressure in chambers such as CVD (chemical vapor deposition), PVD (physical vapor deposition), ALD (atomic layer deposition), etching, etc. Real time pressure detection is achieved through ionization principle to ensure stable operation of the process under set vacuum conditions.
During plasma processing, controlling the vacuum degree is a key parameter for maintaining ion energy and density in plasma reaction equipment. This ion meter can provide real-time feedback on the vacuum status of the chamber.
The ion implantation equipment maintains a stable high vacuum inside the implantation chamber to prevent ion beam scattering and improve implantation accuracy.
As vacuum monitoring sensors, vacuum pumps and system monitoring are used in conjunction with mechanical pumps, molecular pumps, turbo pumps, etc. to provide feedback on vacuum system pressure and ensure stable pump performance.
Equipment maintenance and calibration are used for system vacuum degree verification, sealing detection, leakage diagnosis, and equipment status assessment.
AMAT Applied Materials 0190-48491適配器 產(chǎn)品展示
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